Description
Gaskleen® II EL Purifier Assembly
Pall Gaskleen II EL purifier assemblies are designed to remove molecular contamination from many process gases. Sub-parts-per-billion (ppb) level purification is achieved for flow rates up to 30 slpm, with excursions up to 50 slpm1, while providing ≥ 3 nanometer (nm) particle removal.
- Controls and removes impurities such as moisture, oxygen, carbon dioxide, non-methane hydrocarbons, metal carbonyls, and siloxanes
- 316L stainless steel housing
- Wide variety of gases purified
- 100% helium leak and pressure tested
- Not orientation senstive2
- No detectable metal contribution above background in HCl gas with HCLP materia
- No detectable metal contribution above background in HBr gas with HBRP material
Products on this page may be covered by one or more patents, including US 7,465,692.
Specifications
Materials |
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Particle Removal Efficiency Rating |
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Connections |
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Operating Conditions |
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Packaging |
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1Contact the Pall
2Particle rating based on laboratory testing with NaCl
3VCR is a trademark of Swagelok Co.
Type
Additional Information
Technical Information
Impurity Removal as Tested in Specific Gases
Specific Gas | Impurity Removal Efficiency |
Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer |
Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether, Ethylene, Propylene, Carbonyl Sulfide | < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen, and hydrogen using APIMS analyzer < 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer H2O and siloxanes removed to trace levels as tested in silane using APIMS |
Carbon Monoxide | < 10 ppb Ni(CO)4 and < 1 |
Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane | < 1 ppb H2O, CO2, and CO as tested in argon and nitrogen using APIMS analyzer < 1 < 10 ppb H2O as tested in |
Germane | < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS |
Sulfur Hexafluoride | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen |
< 1 ppb H2O and CO2 as tested in argon using APIMS analyzer | |
Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane | < 1 ppb H2O and CO2 as tested in argon using APIMS analyzer |
Hydrogen Chloride | < 15 ppb H2O as tested in hydrogen chloride using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
Hydrogen Bromide | < 50 ppb H2O as tested in hydrogen bromide using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
Photolithography Clean Dry Air | < 1 ppb H2O as tested in argon using APIMS analyzer < 300 ppt C4H8 as tested in argon using APIMS analyzer < 10 ppt SO2 as tested in nitrogen using ion < 15 ppt NH3 as tested in nitrogen using ion < 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction |
Dimensions
![](/INTERSHOP/static/WFS/PALL-PALLUS-Site/-/PALL/en_US/images/Microelectronics/Gaskleen_II_EL_Purifier_graphic4.jpg)
Ordering Information
Part Numbers / Ordering Information
Part Number Specification | Specific Gas | Effluent Impurity Specifications |
GLP6INPVMM4 | Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon | < 1 ppb H2O, CO2, O2, CO |
GLP6SIPVMM4 | Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether, Ethylene, Propylene, Carbonyl Sulfide Carbon Monoxide | < 1 ppb H2O, CO2, O2, CO < 1 ppb H2O, O2, CO2, Fe(CO)5 < 10 ppb Ni(CO)4 |
GLP6FCPVMM4 | Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane | < 1 ppb H2O, CO2, O2 |
GLP6GEH4PVMM4 | Germane | < 1 ppb H2O, CO2, O2, CO |
GLP6SF6PVMM4 | Sulfur Hexafluoride | < 1 ppb H2O, CO2, O2, CO |
GLP6OXPVMM4 | Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide | < 10 ppb H2O |
GLP6CLXPVMM4 | Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane | < 100 ppb H2O |
GLP6HCLPVMM4 | Hydrogen Chloride | < 15 ppb H2O |
GLP6HBRPVMM4 | Hydrogen Bromide | < 50 ppb H2O |
GLP6CDAPVMM4 | Photolithography clean dry air | < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO) |
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