A unique combination of Pall's leading edge AresKleen™ purification material, combined with Ultramet-L® stainless steel filter medium, creating the industry's most advanced true point-of-use purifier.
The Gaskleen top mount purifier assembly is designed to remove homogeneous contamination from process gases to sub ppb levels, while providing 3 nm filtration.
The Gaskleen top mount purifier assembly is designed to remove homogeneous contamination from process gases to sub ppb levels, while providing 3 nm filtration.
- Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
- Assembly hardware is made of 316 L stainless steel
- High efficiency diffusion barrier insures integrity of reactive material until in service and upon removal
- Superior pressure drop characteristics
- Wide variety of gasses purified
- 100% helium leak and pressure tested
- Will not release hydrocarbons
- Not orientation sensitive
- No detectable metal contribution above background in HCl gas with HCLP material
- No detectable metal contribution above background in HBr gas with HBRP material
Materials
- Electropolished 316 L stainless steel components except canister
- ≤ 0.13 μm / 5 μin Ra internal surface finish
Particle Removal Efficiency Rating
- 1 x 109 retention of particles ≥ 3 nm up to 15 slpm
Connections
- C-seal, 1.125 in. Interface
Operating Conditions
- Maximum operating pressure: 3.5 MPa @ 100 °C / 500 psig @ 212 °F
- Maximum operating temperature: 100 °C / 212 °F (INP, SIP, FCP, SF6P), 40°C / 104°F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
- EU Pressure Equipment Directive: Assemblies have been evaluated and designed using SEP per the European Union's Pressure Equipment Directive 2014/68/EU and are not CE marked
Design Flow Rate
- 0-3 slpm @ 0.21 MPa / 30 psig
- Intermittent flow rates up to 15 slpm can be accommodated1
Packaging
- Double bagged Outer bag: aluminized mylar2 Inner bag: polyethylene
- Product packaged in argon environment
Dimensions
- Height: 76.2 mm / 3.0 in.
- Base width: 28 mm /1.125 in.
- Shell diameter: 28 mm / 1.125 in.
1 Contact Pall Microelectronics for further information.
2 Mylar is a registered trademark of Dupont Teijin Films, US Limited.
Technical Information
Impurity Removal as Tested in Specific GasesSpecific Gas | Impurity Removal Efficiency |
Inert gases: Nitrogen, argon, helium, xenon, krypton, neon | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer |
Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether | < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen and hydrogen using APIMS analyzer < 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer H2O and siloxanes removed to trace levels as tested in silane using APIMS |
Carbon monoxide | < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer |
Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer < 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer < 10 ppb H2O as tested in trifluoromethane using trace moisture analyzer and FTIR |
Germane | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer |
Sulfur hexafluoride | < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS |
Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide, clean dry air | < 10 ppb H2O < 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer |
Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane | < 100 ppb H2O < 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer |
Hydrogen chloride | < 15 ppb H2O as tested in hydrogen chloride using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
Hydrogen bromide | < 50 ppb H2O as tested in hydrogen bromide using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
Photolithography clean dry air | < 1 ppb H2O as tested in argon using APIMS analyzer < 300 ppt C4H8 as tested in argon using APIMS Analyzer < 10 ppt SO2 as tested in nitrogen using ion chromatograph < 15 ppt NH3 as tested in nitrogen using ion chromatograph < 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction |
Unit conversion: 100 kilopascals = 1 bar
Pressure Drop vs. Gas Flow Rate

Lifetime Calculations
Pall AresKleen purification material: Inert gas service Gaskleen 1.125 in C-Seal Base Top Mount purifier assembly, Part # GTMP3INPCC4Inlet pressure: 0.21 MPa (30

Pall AresKleen purification material: Inert gas service Gaskleen 1.125 in C-Seal Base Top Mount purifier assembly, Part # GTMP3INPCC4
Inlet Pressure: 0.21 MPa (30 psig) contaminant challenge as O2

Systems
Dimensions

Part Number | Specific Gas | Effluent Purity Specifications |
GTMP3INPCC4 | Inert gases: Nitrogen, argon, helium, xenon, krypton, neon | < 1 ppb H2O, CO2, O2, CO |
GTMP3SIPCC4 | Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether | < 1 ppb H2O, CO2, O2, CO |
Carbon monoxide | < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5 | |
GTMP3FCPCC4 | Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane | < 1 ppb H2O, CO2, O2 |
GTMP3GEH4PCC4 | Germane | < 1 ppb H2O, CO2, O2, CO |
GTMP3SF6PCC4 | Sulfur hexafluoride | < 1 ppb H2O, CO2, O2, CO |
GTMP3OXPCC4 | Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide | < 10 ppb H2O |
GTMP3CLXPCC4 | Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane | < 100 ppb H2O |
GTMP3HCLPCC4 | Hydrogen chloride | < 15 ppb H2O |
GTMP3HBRPCC4 | Hydrogen bromide | < 50 ppb H2O |
GTMP3CDAPCC4 | Photolithography clean dry air | < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO) |
Unit conversion: 1 bar = 100 kilopascals
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