Description
Lithography Filter for Leading-edge Process
The PhotoKleen™ NTD filter cartridge is designed for aggressive organics solvent application.
The PhotoKleen™ NTD filter is composed of all fluoropolymer materials that offer superior chemical compatibility with more aggressive lithography solvents such as: n-butyl acetate (nBA), cyclohexanone, dibutyl ether, toluene and gamma-butyrolactone.
The 5 nm rated PTFE media offers high particle retention while maintaining a low pressure drop.
Features
- Available in 4”, 10” and 20” length
- All fluoropolymer construction for the highest levels of cleanliness
- Guaranteed metal, particle and organic cleanliness1
Benefits
- Offers lower flow delta-P, to minimize ESD and bubble formation
- Shipped dry for use in organic lithography solvents
1 Contact Pall technical service for device claims
Specifications
Materials of Construction
| Components | Materials2 |
| Filter Medium | Functionalized PTFE |
| Support and Drainage | PFA |
| Core, Cage and End Caps | PFA |
| O-ring | Perfrez3 PXC-Ultra |
2All fluoropolymer materials made without PFOA
3 Perfrez is a trademark of Applied Seals North Americas
| Removal Ratings | 5 nm |
| Filter Areas | ABF04 : 0.7 m2 ABF1 : 1.6 m2 ABF2 : 3.1 m2 |
| Maximum Operating Temperature | 110 °C / 230 °F |
| Maximum Forward Differential Pressure | 0.59 MPa @ 50 °C / 86 psid @ 122 °F 0.41 MPa @ 110 °C / 59 psid @ 230 °F |
Typical Flow Characteristics - 1cP fluid, 20℃
Type
Filter Capsules
Ordering Information
ABF [1] NTD23EH38
Table 1
| Code | Nominal Length (L) |
| 04 | 4 inch |
| 1 | 10 inch |
| 2 | 20 inch |
Nominal Dimensions
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