Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Filter Removal Rating

100 µm

Ultipor III Wire Mesh 100 micron Nitrile 4in 10.16cm product photo

Ultipor® I Cleanable Filter Element

Product ID: HC9600EOS4H
Unit of Measure
12/EA
Min Order Qty
12
Element Series
HC9600
Nominal Length (Imperial)
4 in
Seal Material
Nitrile
Ultipor III Wire Mesh 100 micron Nitrile 8in 20.32cm product photo

Ultipor III Wire Mesh 100 micron Nitrile 8in 20.32cm

Product ID: HC9600EOS8H
Unit of Measure
12/EA
Min Order Qty
12
Element Series
HC9600
Nominal Length (Imperial)
8 in
Seal Material
Nitrile
Ultipor III Wire Mesh 100 micron Fluorocarbon 8in 20.32cm product photo

HCA082EOS8Z ELEMENT

Product ID: HCA082EOS8Z
Unit of Measure
1/EA
Min Order Qty
1
Element Series
HCA082
Nominal Length (Imperial)
8 in
Seal Material
Fluorocarbon

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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