Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Food & Beverage

CTRG AB3 PROFILE C7 005H4 W product photo

CTRG AB3 PROFILE C7 005H4 W

Product ID: AB3Y0057WH4
Unit of Measure
1/EA
Min Order Qty
1
AB3Y0107WH4 product photo

AB3 PROFILE C7 010H4 W OPTION

Product ID: AB3Y0107WH4
Unit of Measure
1/EA
Min Order Qty
1
AB3Y0107WJ product photo

CTRG AB3 PROFILE C7 010J W

Product ID: AB3Y0107WJ
Unit of Measure
1/EA
Min Order Qty
1
AB3Y0507WH4 product photo

Filter 30" Profile II 5µm W OPTION

Product ID: AB3Y0507WH4
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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