Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Cartridge Length (Metric)

508 mm

NXA 5-20U-M7E product photo

Nexis, NXA, 5 μm, 50.8 cm (20 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXA520UM7E
Unit of Measure
12/EA
Min Order Qty
12
5 micron
NXT 30-20U product photo

Nexis, NXT, 30 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT3020U
Unit of Measure
10/EA
Min Order Qty
10
30 micron
NXT 3-20U product photo

Nexis, NXT, 3 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT320U
Unit of Measure
10/EA
Min Order Qty
10
3 micron
NXT 50-20U-M3F product photo

Nexis, NXT, 50 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT5020UM3F
Unit of Measure
24/EA
Min Order Qty
24
50 micron
NXT 50-20U-H21 product photo

Nexis, NXT, 50 μm, 50.8 cm (20 in), DOE, Santoprene gasket seal

Product ID: NXT5020UH21
Unit of Measure
20/EA
Min Order Qty
20
50 micron
NXT 5-20U product photo

Nexis, NXT, 5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT520U
Unit of Measure
10/EA
Min Order Qty
10
5 micron
NXT 75-20U product photo

Nexis, NXT, 75 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT7520U
Unit of Measure
10/EA
Min Order Qty
10
75 micron
R2F100 product photo

R2F100

Product ID: R2F100TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polypropylene
Filter Cartridge Style
RF-style
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
End Configuration
R type housing
See All Attributes
R2F200 product photo

R2F200

Product ID: R2F200TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24
Membrane Material
Polypropylene
Filter Cartridge Style
RF-style
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
End Configuration
R type housing
See All Attributes
105 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English