Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Gasket / O-Ring Material

NA

Cartridge Length (Metric)

762 mm

Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal product photo

Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal

Product ID: NXA0530UH21
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
0.5 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
NA
See All Attributes
Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal product photo

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal

Product ID: CLR130H21
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
NA
See All Attributes
NXT 1-30U product photo

Nexis, NXT, 1 μm, 76.2 cm (30 in), DOE industrial (no end caps)

Product ID: NXT130U
Unit of Measure
10/EA
Min Order Qty
10
1 micron
CLR 10-30 product photo

10um, 30", DOE

Product ID: CLR1030
Unit of Measure
12/EA
Min Order Qty
12
10 micron
76.2 cm / 30 in
NXA 10-30U-H21 product photo

Nexis, NXA, 10 μm, 76.2 cm (30 in), DOE, Santoprene gasket seal

Product ID: NXA1030UH21
Unit of Measure
12/EA
Min Order Qty
12
10 micron
NXA 10-30U product photo

Nexis, NXA, 10 μm, 76.2 cm (30 in), DOE industrial (no end caps)

Product ID: NXA1030U
Unit of Measure
12/EA
Min Order Qty
12
10 micron
Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal product photo

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal

Product ID: NXT1030UH21
Unit of Measure
10/EA
Min Order Qty
10
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
NA
See All Attributes
NXT 10-30U product photo

Nexis, NXT, 10 μm, 76.2 cm (30 in), DOE industrial (no end caps)

Product ID: NXT1030U
Unit of Measure
10/EA
Min Order Qty
10
10 micron
1um, 30", DOE product photo

1um, 30", DOE

Product ID: CLR130
Unit of Measure
12/EA
Min Order Qty
12
1 micron
76.2 cm / 30 in
CLR 20-30 product photo

20um, 30", DOE

Product ID: CLR2030
Unit of Measure
12/EA
Min Order Qty
12
20 micron
76.2 cm / 30 in
Nexis® A Series Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal product photo

Nexis® A Series Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal

Product ID: NXA2030UH21
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
20 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
NA
See All Attributes
NXA 20-30U product photo

Nexis, NXA, 20 μm, 76.2 cm (30 in), DOE industrial (no end caps)

Product ID: NXA2030U
Unit of Measure
12/EA
Min Order Qty
12
20 micron
34 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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