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Our filters provide effective and reliable protection against damaging contaminants that threaten the color filter surface.
Our Process Gas Filtration and Purification systems are engineered to remove impurities and contaminants to enable the efficient manufacturing of displays with increasing pixel density.
Our lithography filters effectively eliminate contaminants and defects in lithography process chemicals. They reduce chemical waste and start-up time associated with filter changes, and offer finer removal characteristics and superior initial cleanliness over previous products.
Our capsule filters are specifically designed to remove gelatinous material and particles from liquid crystal material, in the manufacture of thin film transistor displays. These filters are designed with low outgassing and broad chemical compatibility.
Our filters are ideal for reliable, consistent filtration with very high flow rates and are designed with a high contaminant-holding capacity, leading to best printing quality and repeatability by removing oversized pigments and other agglomerates, organic/bacterial matter, and gelatinous residues.
Display Clean Filters for wet etching, stripping, developing and cleaning applications for making TFT arrays, as well as the steps involved in the color filter process.
Find out more about how ink degas modules can improve printing quality and reduce imperfections by eliminating nozzle blockages
Find out more about how ink degas modules can improve printing quality and reduce imperfections by eliminating nozzle blockages
Point of use filtration on ink jet printers is essential to achieve superior image quality and optimize printer uptime. Find out more about our filtration solutions for first-class images, every time.
Gaskleen Filters are designed for use in the photovoltaic industries, to eliminate defects in the silicon ingots as well as the photovoltaic cells
Process gas purification systems remove impurities that pose a major threat to the vitality of the PV Silicon/CIGS wafer. These filters work to expel impurities including moisture, oxygen, carbon dioxide, carbon monoxide, hydrocarbons and metal carbonyls.
Advanced reclamation solutions help silicon ingot manufacturers better manage wastewater to control process performance requirements, minimize machine fouling and sediment buildup, and reduce operational expenses
Wet Etch clean Filters provide cleanliness solutions for different sterilization systems like recirculating chemical baths, high pressure jet sprays, and mechanical scrubbing systems.
A broad range of applications for the semiconductor industry, including process gas filtration, trace moisture detection, ultrapure water, and wet etch and cleans.
Filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
Slurry filtration for defect reduction and process stability in semiconductor processes
Filters to eradicate contaminants in lithography process chemicals
Industry-leading metal fiber technology for rapid gas displacement and molecular transparency during routine maintenance and system upsets.
Ultrapure Water Filtration products are engineered to exceed cleanliness requirements, for quantitatively removing colloidal silica, particles, total organic carbon (TOC), bacteria, pyrogens (bacterial fragments) and metal ions.
